**4.4 Patterning of transparent conducting oxide (TCO) layers by femtosecond laser**

A method for patterning crystalline indium tin oxide (c-ITO) patterns on amorphous indium tin oxide (a-ITO) thin films is proposed by femtosecond laser irradiation at 80 MHz repetition rate. The laser patterning technique provides a versatile and highly precise means of fabricating the transparent electrode structures required in a wide range of modern optoelectronic devices. High repetition rate femtosecond (80 MHz) laser-induced crystallization and proposed laser patterning technique provides a versatile and highly precise means of fabricating TCO structures [42].
