**3.3 Reactive ion etching (RIE)**

Texturing surface have been developed using the reactive ion etching (RIE) method, which is expected to form a low reflectance surface on various crystalline orientations of grains [34, 35].

#### **Figure 1.**

*Pulsed-laser hyper doping and surface texturing, Cambridge (2001) (ref. R. Younkin, PhD dissertation, Harvard University), (a) scanning electron micrographs, (b) illustration of the optical path (adapted from [31] with permission).*
