**2.2 Deposition**

The multilayer coatings were deposited on the steel AISI4140 by the process of spraying DC magnetron mode, using target compounds TiAl (50°/°Ti, 50°/°Al) [3] and Al-Ti-Zr (19°/°Ti, 21°/° to Al, 10°/°Zr, 50°/°N) of high purity (99.9999%).

The samples were mounted on a continued rotating satellite inside the vacuum plasma chamber. The atmosphere was chosen to produce successively under a layer of TiAl, a buffer layer of TiAlN, and then a layer of TiAlCN or TiAlZrN. Indeed, the thin films of TiAl and TiAlN aim to improve the adhesion layers TiAlCN [2, 3] and TiAlZrN [10] with steel. The optimum conditions for filing as the bias voltage targets, temperature, and time of deposition were determined and optimized in previous studies; **Table 1** shows in detail the optimal conditions for verification. In addition, Argon, acetylene, and nitrogen gas which are of very high purity (99.999%) were introduced into the vacuum chamber. The basic pressure in the room was 5.10−5 Pa, which grew to 0.1 Pa for the deposition of desired layers. The distance between the target and the substrate surface was 35 mm. Before the deposition, the surface of the substrate was cleaned by argon ion bombardment at the end to eliminate all these antagonists.
