**Abstract**

In this chapter, we have discussed about the fabrication of MgTiO3 and (K0.5Na0.5) (Nb0.7Ta0.3)O3 (KNNT) thick films via EPD, including the preparation of stable suspension, which is the essential requirement for EPD. Acetone and isopropyl alcohol are used as solvents for MgTiO3 and (K0.5Na0.5)(Nb0.7Ta0.3)O3, respectively. In both the cases triethanolamine (TEA) is used as the surfactant. It was observed that with increase in applied voltage and deposition time, the deposition of particle on the substrate has increased. For KNNT particle the optimum voltage and time to get quality film was 100 V and 10 min respectively. The surface morphology and film thickness was analyzed from SEM images. The thickness of KNNT and MgTiO3 films was found to be 32 ̴ and 18–20 μm (for film sintered at 900°C) respectively. In the case of MgTiO3 thick films, the sintering temperature plays an important role in the quality of films since it affects the density and grain growth. An increase in the sintering temperature, from 800–900°C, resulted in increase in the dielectric constant and reduced loss. The dielectric values of the KNNT and MgTiO3 thick film at 1 MHz was 320 and 18.3 respectively.

**Keywords:** electrophoretic deposition, dielectric thick film, MgTiO3, K0.5Na0.5Nb0.7Ta0.3O3, dielectric constant
