**7. Poly(olefin sulfone)s composed of volatile monomers**

The photoinduced depolymerization of poly(olefin sulfone)s composed of volatile olefins was investigated [18]. The polymers were converted into volatile compounds by photoinduced depolymerization. A poly(olefin sulfone) film containing a photobase generator (ANC2) was irradiated with 254‐nm light at ambient temperature through a photomask. While very little change occurred in the film just after irradiation, the irradiated area of the film vaporized upon heating to 110**°**C, forming a mask pattern on the film (**Figure 19**). The surface of the film was also observed by AFM after heat treatment. The results confirmed that the irradiated area was removed, leaving a bare surface. This enables a wide variety of applications, such as stereolithography without the use of solvents, photo‐detachable adhesives, and printable nanocircuit fabrication.

**8. Application of photo‐depolymerizable poly (olefin sulfone)s to** 

showed that depolymerizable polymers can act as detachable adhesives.

Detachable adhesives have attracted great interest due to their potential applications in reusable products and reworkable systems [22–26]. Adhesives used in many applications, and a variety of strong adhesives that can be employed in extreme environments have been developed [27]. However, most high‐performance adhesives are strongly adhesive, making them difficult to remove and therefore cannot be used in recyclable materials or in reworking processes. Therefore, a need exists for glues that provide firm bonding but also can be easily detached. The strength of an adhesive bond essentially depends on surface interactions between the adhesive material and the substrate. Therefore, if the chemical structure of the adhesive material can be changed after adhesion, the adhesion strength may also change. Studies have been reported on the adhesive strength of substrates fastened using degradable polymers [23, 24, 26]. The results

**Figure 19.** (a) Changes in a photomask pattern irradiated film during heating at 110**°**C. (b) AFM image of the photomask

Poly(olefin sulfone)s

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http://dx.doi.org/10.5772/intechopen.69317

**photo‐detachable adhesives**

pattern irradiated area of the PMPS film after heating at 110**°**C for 15 min.

**Figure 19.** (a) Changes in a photomask pattern irradiated film during heating at 110**°**C. (b) AFM image of the photomask pattern irradiated area of the PMPS film after heating at 110**°**C for 15 min.
