Preface

Ion implantation is a versatile technique broadly implemented in different areas of science and technologies. It has been observed as a continuously evolving technology. Ion Implanta‐ tion is a reliable technology due to its accurate control over the dopant compositions and penetration depth through the choice of the species and the energies of the ions. Indeed, importance of ion implantation technology has been recognized to produce many commer‐ cial products. However, the development of new devices and materials through this tech‐ nology is still looking for the benefit of human being.

In addition, MeV ion implantation and defects engineering are another new emerging sci‐ ence and technology class where research and innovation are going on. As for as the materi‐ als science concern, defects play an important role in the pattern of properties of materials that may be tuned according to our needs, whereas defects engineering in biocompatible materials is a promising technology for enhancing the properties of biomaterials. Surface modifications of polymers for the improvement in compatibility of the blood and tissue are few other examples where the ion implantation is playing a vital role.

In this book, there is a detailed overview of the recent ion implantation research and innova‐ tion along with the existing ion implantation technological issues especially in microelec‐ tronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.

The substantial part of this book concise the influence of ions on the characteristics of the material in particular semiconductor materials and devices. The third section of this book relates MeV ion beam appointment to fabricate devices. The final section of the book delin‐ eates the impact of the ion beam on the properties of biomaterials.

Finally and foremost, I wish to record my sincere appreciation to the researchers who poten‐ tially contributed in this book undertaking: Prof. Dr. Y. G. Fedorenko, Prof. Dr. Heriberto Márquez, Prof. Dr. Gloria V. Vázquez, Prof. Dr. Eder G. Lizárraga-Medina, Prof. Dr. Raúl Rangel-Rojo, Prof. Dr. David Salazar, Prof. Dr. Alicia Oliver, Prof. Dr. Xin Zhou, Prof. Dr. Yiming Zhang, Prof. Dr. Xiaohua Shi, Prof. Dr. Dongli Fan, Prof. Dr. S. Kaschieva, Prof. Dr. S. N. Dmitriev, Prof. Dr. G. Husnain, Prof. Dr. Morgan Madhuku, Dr. Shehla Honey, and Ms. Marijana Francetic, Publishing Process Manager.

> **Ishaq Ahmad** National Centre for Physics Islamabad, Pakistan

**Section 1**
