*2.1.1. Factors responsible for PLD deposition*

Factors influencing the laser ablation process include the following: (i) **deposition conditions** (nature of ambient‐ultra‐high/high/vacuum, reactive gas, target‐substrate separation distance, number of pulses); (ii) **laser beam parameters** (wavelength and pulse duration fluence); and (iii) **material properties of the target** (melting temperature, thermal diffusion rate, optical reflectivity).

Uniform ablation of the target is obtained through its rotation and translation with respect to the laser beam. The distance between the target and substrate is generally of a few centi‐ metres. The film uniformity can be improved if the substrate is moved in the plasma direc‐ tion, for example, by rotating the substrate holder. The substrate temperature is a very important parameter for the morphology, microstructure, and crystallinity of the deposited films.

**Figure 1.** Experimental set‐up PLD/RPLD.
