**4. Conclusion**

In this work are demonstrated two different lithography techniques based on the use of pulsed UV laser light for the creation of well defined polymeric nanocomposite structures. The presented techniques open up new ways for nanocomposite film patterning with well dispersed and occasionally size controlled NCs. The first technique is the UV laser photopolymerization lithography, where UV laser pulses are used for the polymerization and patterning of nanocomposite solutions of preformed colloidal NPs mixed with monomers and photoinitiators. In the second lithography technique UV laser pulses induce the in situ formation of NPs in specific locations in the polymer matrices, starting from polymeric film incorporating light-sensitive precursors of NPs. Using both techniques we present patterned structures of various nanocomposite systems, such as PMMA with TiO2 NPs, PMMA and SU-8 with Fe2O3 NPs aligned into NWs under external magnetic field, CTO with Au NPs, TOPAS and PMMA with size tuned CdS NPs. The formed nanocomposite structures can exhibit controlled and enhanced surface, optical, electronically conducting and magnetic properties, in an easy and fast way, promising for the development of nanodevices used in biotechnology, optoelectronics, microfluidics and other advanced technological areas.
