**Part 3**

**Interference, Two-Photon, UV and X-Ray Lithography** 

240 Recent Advances in Nanofabrication Techniques and Applications

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**13** 

*France* 

**DUV Interferometry for Micro and** 

*Institut de Sciences des Matériaux de Mulhouse, CNRS LRC 7228, Mulhouse,* 

Recent developments in nanoscience and nanotechnology were strongly supported by advances in nanofabrication. Controlled patterning of nanostructured materials has become increasingly important because of the ever-decreasing dimensions of various devices, including those used in electronics, optics, photonics, biology, electrochemistry, and electromechanics (Henzie et al., 2004; Fan et al., 2006). Today, the production of structures with typical dimension in the 1 to 100 nm range with engineered physical and chemical

Different nano-fabrication techniques have been reported in the literature (Nie & Kumacheva, 2008). Recent examples include optical lithography (Cotton et al., 2009), electron beam lithography (Gonsalves et al. 2009), X-ray lithography (Im et al., 2009), laser writing (Soppera et al., 2008), scanning probe techniques (including optical near-field lithography (El Ahrach et al., 2007), pen nanolithography (Cai & Ocko, 2005), dip-pen lithography (Christman et al., 2009), nanoshaving (Seo & Borguet, 2006) and thermal scribing (Lee et al., 2008)), microcontact printing (Huh et al., 2009), micro-phase separation of block copolymers (Greater et al., 2007), dewetting (Yoon et al., 2008), nanoimprint lithography (He et al., 2009) or electrochemical nanopatterning (Jegadesan et al., 2006). The major remark is that the size of the achievable patterns is strongly dependent of the technique used and can vary between the micrometer to the sub-10 nanometre length scale. This point is a serious limitation when different length scales are needed. Furthermore, in most cases these techniques suffer from different material requirements and limited

In this context, interferometric lithography appears of high interest when periodical patterns are needed. Indeed, interferometric techniques can be considered as massively parallel nanofabrication techniques since patterns can be obtained over large area within a single exposure. Moreover, the recourse to wavelength in the Deep-UV range (DUV corresponds

*3CEA, Laboratoire d'Innovation pour les Technologies des Energies Nouvelles et les nanomatériaux / DEHT/* 

Ali Dirani1,2, Fabrice Stehlin1, Hassan Ridaoui1,3, Arnaud Spangenberg1,

*1Institut de Sciences des Matériaux de Mulhouse, CNRS LRC 7228, Mulhouse, France 2Université Catholique de Louvain, Division of Bio- and Soft Matter, Belgique* 

**1. Introduction** 

properties is challenging.

dimensions of the patterned surface.

Fernand Wieder1 and Vincent Roucoules1

*LPCE, Grenoble, France* 

 \*

**Nanopatterned Surfaces** 

Olivier Soppera et al.\*
