**4. Conclusion**

We presented fabrication and characterization of guided-mode resonant (GMR) filters made by soft lithography. As these resonant elements are highly sensitive to parametric variations, it is important to develop methods for their reliable, repeatable fabrication. Thus, a fabrication process that is consistent and simple, employing an elastomeric mold and a UV-

curable organic-inorganic hybrid material is provided. By combining MIMIC, a hybrimer, and an h-PDMS mold, a photopolymer grating structure is readily fabricated. Measured spectra show ~81% reflectance and ~8% transmittance at a resonance wavelength of 1538 nm. The filter's linewidth is ~4.5 nm, and the sideband reflectance is ~5%. Experimental and theoretical results are in good agreement. The use of hybrimer media yields improved processes and high-quality photonic devices.

#### **5. Acknowledgments**

238 Recent Advances in Nanofabrication Techniques and Applications

Fig. 13. SEM images of the fabricated GMR device. (a) Top down view,

protection during ion-beam sectioning

**4. Conclusion** 

Magnification = 10,000. The size of the image is ~15 μm. (b) Cross-sectional view, Magnification = 25,000. Note that the white part on top is a platinum (Pt) layer for

We presented fabrication and characterization of guided-mode resonant (GMR) filters made by soft lithography. As these resonant elements are highly sensitive to parametric variations, it is important to develop methods for their reliable, repeatable fabrication. Thus, a fabrication process that is consistent and simple, employing an elastomeric mold and a UV-

This work was supported in part by the National Science Foundation (NSF) under grant ECCS-0925774 and by the UT System Texas Nanoelectronics Research Superiority Award funded by the State of Texas Emerging Technology Fund. The authors gratefully acknowledge the NanoPort Applications Team at FEI Company for providing the results shown in Fig. 13. The authors thank Prof. B. Huey from The Institute of Materials Science at the University of Connecticut for providing access to AFM facilities. This work was performed in part at the Center for Nanoscale Systems (CNS), a member of the National Nanotechnology Infrastructure Network (NNIN), which is supported by the NSF under award ECS-0335765. CNS is part of the Faculty of Arts and Sciences at Harvard University. Additional support was provided by the Texas Instruments Distinguished University Chair in Nanoelectronics endowment.

### **6. References**


**Part 3** 

**Interference, Two-Photon,** 

**UV and X-Ray Lithography** 

