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**14** 

*Romania* 

**Ultrashort Pulsed Lasers – Efficient Tools for** 

Fabrication technologies on the micro and nanometer scale are becoming more and more important from the viewpoint of industrial applications, for example: high-resolution lithography for manufacturing high-density recording media, high-resolution displays, and high sensitivity biomolecule sensor arrays. Electron-beam lithography, interferometric lithography, electron-beam evaporation of constituent materials and lift-off procedures were used to fabricate negative refractive-index metamaterials at the near-infrared (NIR) wavelengths (Zhang et al., 2005; Dolling et al., 2006; Dolling et al., 2007). Due to its capability for large-area fabrication, conventional photo-lithography is a wide-spread fabrication technology. Because the minimum feature size is limited by optical diffraction, sub-micrometer structures can be created by deep ultra-violet (DUV) at hundred-nanometer wavelengths or extreme ultra-violet (EUV) at ten-nanometer wavelengths lithography techniques (Gwyn et al., 1998). Because these technologies require complex vacuum optics,

Ultrashort pulsed lasers, particularly femtosecond lasers, could offer an alternative to currently used micro and nanostructuring methods (Nishiyama et al., 2008; Qi et al., 2009; Allsop et al., 2010; Sugioka et al., 2010). High peak power can be reached for femtosecond pulses at relatively low energy per pulse. Due to the high radiation intensity, nonlinear effects dominate the interaction of tightly focused femtosecond laser beams with materials. Pulsed laser micromachining involves the removal of material through the ablation process which consists in some consecutive physical processes: laser energy absorption, material

The first step in laser ablation is the absorption of laser energy by the target material. The absorption mechanism depends on laser intensity (laser fluence and pulsewidth) and can be accomplished by linear and nonlinear processes. For opaque materials at laser radiation wavelength, linear absorption is the main mechanism at long pulsewidths with low intensity, whereas the nonlinear absorption becomes dominant at ultrashort pulsewidths with high intensity. For transparent materials, absorption comes from nonlinear processes through laser-induced optical breakdown. It is a process where a normally transparent material is first transformed in absorbing plasma by avalanche ionization and multiphoton

heating, material expelling, and material cooling (Liu et al., 1997; Stuart et al., 1996).

**1. Introduction** 

their cost remains prohibitive.

Marian Zamfirescu1,2, Magdalena Ulmeanu1, Alina Bunea2,

*1National Institute for Laser, Plasma and Radiation Physics,* 

**Materials Micro-Processing** 

Gheorghe Sajin2 and Razvan Dabu1

*2National Institute for Microtechnology,* 

