**5. Acknowledgment**

348 Recent Advances in Nanofabrication Techniques and Applications

size of 60nm line width can be resolved in photoresist layer when silver slab separated 100nm from mask. By proper design and choice of material, nanolithography with better resolution can be realized by the very function of silver slab, and this technique will be a

Fig. 15. The distribution of electromagnetic field in the model (Both X and Z is in unit of μm.

Fig. 16. The distribution of optical field in the 10nm cross-section of photoresist when silver

Two types of maskless lithography are discussed in this chapter. The first uses an array of high-numerical-aperture photon sieves as focusing elements in a scanning X-ray maskless nanolithography system. The system operating at wavelength of 0.5~2nm synchrotron light sources radiated, each of a large array of photon sieves focuses incident X-ray into a diffraction-limited on-axis nanoscale spot on the substrate coated photoresist. The X-ray intensity of each spot is modulated by means of a spatial light modulator. Patterns of arbitrary geometry are exposed and written in a dot matrix fashion while the substrate on a stepping stage is precisely driven in two dimensions according to the computer program.

Photoresist layer lies between Z=0.37μm and Z=0.47μm).

slab separated 100nm from mask.

**4. Conclusion** 

possible alternative nanolithography technique for the next generation lithography.

This work was supported by the grants from the Guangdong Natural Science Foundation (S2011040000711), the Key Lab of Robotics & Intelligent System, Guangdong Province (2009A060800016), the Guangdong & Chinese Academy of Sciences Cooperation Project (2009B091300160), National Natural Science Foundation of China (60904031; 60776029), Shenzhen Science & Technology Research Funds (2009-203), the Main Direction Program of the Knowledge Innovation of Chinese Academy of Sciences (KGCX2-YW-166), and the Scientific Research Foundation for the Returned Overseas Chinese Scholars of Ministry of Education, China (2008-890).
