**9. References**

528 Recent Advances in Nanofabrication Techniques and Applications

**476 530**

**470504**

Fig. 16. UV-vis optical absorption of Ag NPs. (a) Surface confined Ag NPs before tip rounding and surface modification. (b) Surface confined Ag NPs after tip rounding (c) Surface confined Ag NPs with rounded tips after surface modification with thiol. (d) Aqueous phase Ag NPs after releasing the surface confined NPs into water. (Adapted from

Song et al., Appl. Surf. Sci. 2010 256, (20), 5961, Figure 5. Copyright (2010) Elsevier.)

**7. Perspective for the NSL in the controlled fabrication of nanomaterials** 

obvious agglomeration as in the solution-phased nanocolloids synthesis.

The great progress in controlled synthesis/fabrication of noble metal NPs by NSL, and the increase in the experimental and theoretical achievements in control of their size, shape, surface morphology and 3-dimensional space orientation dependent physicochemical properties and functions suggest expanding application in many fields because of the potential for essential breakthroughs by researchers and engineers for more advanced applications of NSL. Particularly, the developed multi-step angle resolved NSL and the modified NSL incorporated with suitable post-treatments have enabled us to obtain uniform surface-confined overlapped and nano-gapped nanostructures, the tip-rounded triangular nanoprisms, the square-shaped and the trapezoidal nanoprisms, besides the common triangular nanoprisms. Besides the marvelous progresses in the surface-confined nanostructures fabrication, a modified NSL process has also been developed to dislodge these uniform nanomaterials into the desired solvents (e.g. water, ethanol) without any

Progresses in the incorporation of NSL with other LIGA techniques have shown that the suitability and ability in the architecture and interspacing controlled fabrication of NPs and nanoarrays. Their applications can thus be expanded extremely. When the multi-hierarchy arrayed micro windows fabricated by the traditional UV-LIGA process is joined in NSL, one powerful method for single nanoparticle identification will be born, resulting in the possibility of the precise investigation of the 3D morphology dependent LSPR of nanoparticles and LSPR coupling in nanoarrays. By collaboration with UV-LIGA microfabrication, uniform noble metal nanoparticles or nanoarrays can be fabricated into the targeted micro channels, leading to a much sensitive optical biosensing system after their

**c**

**a b**

**630 668**

**d**

**300 400 500 600 700 800 Wavelength [nm]**

**0.00 0.02**

**0.04 0.06 0.08**

**0.10 0.12 0.14**

**350**

**Absorption [a.u.]**


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**26** 

*China* 

**A Feasible Routine for Large-Scale** 

Zhenyang Zhong, Tong Zhou, Yiwei Sun and Jie Lin

*Fudan University/Department of Physics Shanghai,* 

**Nanopatterning via Nanosphere Lithography** 

Due to the unique electronic, optical, catalytic and biological properties, well ordered nanostructures have attracted enormous interest. They have potential applications in photonic crystal devices (Yablonovitch, 1987), large-density magnetic recording devices (Chou et al., 1994), novel electronic devices (Schmidt & Eberl, 2001), synthesis of DNA electrophoresis mediate (Volkmuth & Austin, 1992),nanocontainers (Chen et al., 2008), surface-plasmon resonance biosensors (Brolo et al., 2004), antireflective coatings for solar cells (Yae et al., 2005), and etc. Such broad applications of nanostructures were intimately associated with their unique properties, which are sensitively dependent on their size and/or shape. It is well-established that magnetic (Shi et al., 1996; Zhu et al.,2004), optical (Aizpurua et al., 2003; Larsson et al. 2007), electrocatalytic (Bratlie et al., 2007; Narayanan & El-Sayed, 2004), optoelectronic (Chovin et al., 2004), data storage (Ma, 2008), thermodynamic (Volokitin et al., 1996; Wang et al., 1998) and electrical transport (Andres et al., 1996; Bezryadin et al., 1997) properties of the nanostructures are affected by the shape

In general, there are two approaches to realize ordered nanostructures with desired size, shape and arrangement. One is the "bottom up" approach on pre-patterned substrates (Zhong et al, 2007; Zhong et al., 2008). The other is the "top-down" approach (Ito & Okazaki, 2000). Both of these two approaches are always based on lithographic technology. In the first approach, lithographic techniques were employed to fabricate various patterned substrates, on which ordered nanostructures can then be realized by subsequent growth of desired materials. The main reason for this approach is to suppress defects in the nanostructures. In the second approach, ordered nanostructures can be directly fabricated by lithographic techniques. Several standard lithographic techniques are frequently exploited to fabricate desired surface nanostructures, including holographic lithography, electron-beam lithography (EBL) and ion-beam lithography (IBL) (Arshak et al., 2004;Ebbesen et al., 1998; Ito & Okazaki, 2000). Recently, a new extreme ultraviolet (EUV) lithography was developed, which is a potential candidate for achieving critical dimensions below 100 nm (Service, 2001). In addition, there are some other lithographic techniques applied in the fabrication of nanostructures (Haynes & Van Duyne, 2001). However, fabrication of nanostructures in a regular arrangement over large areas is still a major challenge in modern nanotechnologies. There is substantial interest in developing new technologies to facilitate pattern fabrication.

**1. Introduction** 

and the size, as well as the interfeature spacing.

