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This research has been partially supported by the Management Expenses Grants for National Universities Corporations and a Grant-in-Aid for Young Scientists from The Ministry of Education, Culture, Sports, Science and Technology (MEXT), Precursory Research for Embryonic Science and Technology program from Japan Science and Technology Agency (JST) and a Grant-in-Aid for Scientific Research from Japan Society for the Promotion of Science (JSPS). The authors would like to express their sincere appreciation to Dr. M. Hirasaka of Teijin Ltd. and Research Manager K. Kubo of Teijin DuPont Films Japan Ltd. for supplying PEN organic films, Prof. Y. Hirotsu, Assoc. Prof. M. Ishimaru and Assist. Prof. A. Hirata at Osaka University for investigating cross-sectional TEM images and ED patterns, Y. Inoue of Meiwafosis Co., Ltd. for examining the fabrication of NiO insulators and Prof. M. Yamamoto, Assist. Prof. K. Matsuda, A. Ono, N. Basheer, N. Kawaguchi, S. White, H. Sato and M. Takei at Hokkaido University for their cooperation

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**29** 

*1China 2Singapore* 

**Extremely Wetting Pattern by Photocatalytic** 

*2School of Materials Science and Engineering, Nanyang Technological University* 

Wettability is an important property governed by not only chemical composition, but also geometrical structure as well (Ichimura et al., 2000; Lai et al., 2009a; Wang et al., 1997). Super-wetting and antiwetting interfaces, such as superhydrophilic and superhydrophobic surfaces with special liquid-solid adhesion have recently attracted worldwide attention. Superhydrophilicity and superhydrophobicity are defined based on the conventional water contact angle experiment. If the contact angle is smaller than 5°, the surface is said to be superhydrophilic. Superhydrophobic refers to surface with contact angle greater than 150°. Such two extremely cases have attracted much interest due to their importance in both theoretical research and practical application (Lafuma & Quéré, 2003; Liu et al., 2010; Gao &

In recent years, patterned thin films have received considerable attentions due to their interesting properties for a range of applications, such as optoelectronic devices, magnetic storage media, gas sensors, and fluidic systems. Compared to the conventional thin film technology, such as physical vapor deposition (Li et al., 2006; Zhang & Kalyanaraman, 2004), chemical vapor deposition (Jeon et al., 1996; Slocik et al., 2006) and sputtering (Rusponi et al., 1999), solution-based deposition method is becoming popular for the fabrication of patterning films due to the low temperature process under ambient environment, less energy and time consumption, and easier control of the experimental parameters (Lai et al., 2010a; Liu et al., 2007; Yoshimura & Gallage, 2008). Although traditional photolithographic technique is excellent for preparing sub-micrometer or even only sub-100-nanometer pattern (Cui & Veres, 2007; Li et al., 2009), it is a complex multi-step process (wafer cleaning; barrier layer formation; photoresist coating; soft-baking; mask alignment; exposure and development; and hard-baking) and needs to remove part of the film and all the photoresist used. Direct and selective assembly of nanostructured materials from precursors paves a new avenue for the fabrication of electronic optical microdevices. Wetting micropatterns with different physical or chemical properties, without the need for ultra-precise positioning, have frequently been acted as templates for fabricating various functional materials in a large scale. The great difference in contact angle of the two extreme cases provides a potentially powerful and economical platform to directly and precisely construct patterned nanostructures in aqueous solution. In general, wetting micropatterns

**1. Introduction** 

Jiang, 2004).

**Lithography and Its Application** 

Yuekun Lai1,2, Changjian Lin1\* and Zhong Chen2\*

*1State Key Laboratory for Physical Chemistry of Solid Surfaces and College of Chemistry and Chemical Engineering, Xiamen University* 

