**UPDATES IN ADVANCED LITHOGRAPHY**

Edited by **Sumio Hosaka**

#### **Updates in Advanced Lithography**

http://dx.doi.org/10.5772/3348 Edited by Sumio Hosaka

#### **Contributors**

Hongbo Lan, Grégory Barbillon, Nima Arjmandi, Athanasios Milionis, Ilker Bayer, Despina Fragouli, Fernando Brandi, Athanassia Athanassiou, Gang Zhang, Khairudin Mohamed, Maan Alkaisi, Arnaud Spangenberg, Prem Prabhakaran, Fernand Wieder, Olivier Soppera, Jean-Pierre Malval, Patrice Baldeck, Nelly Hobeika, Fabrice Stehlin, Razvan Dabu, Michael Wang, Noritaka Kawasegi, Noboru Morita

#### **© The Editor(s) and the Author(s) 2013**

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#### **Notice**

Statements and opinions expressed in the chapters are these of the individual contributors and not necessarily those of the editors or publisher. No responsibility is accepted for the accuracy of information contained in the published chapters. The publisher assumes no responsibility for any damage or injury to persons or property arising out of the use of any materials, instructions, methods or ideas contained in the book.

First published in Croatia, 2013 by INTECH d.o.o. eBook (PDF) Published by IN TECH d.o.o. Place and year of publication of eBook (PDF): Rijeka, 2019. IntechOpen is the global imprint of IN TECH d.o.o. Printed in Croatia

Legal deposit, Croatia: National and University Library in Zagreb

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Updates in Advanced Lithography Edited by Sumio Hosaka p. cm. ISBN 978-953-51-1175-7 eBook (PDF) ISBN 978-953-51-5709-0
