**Characterization of Sol-Gel-Derived and Crystallized HfO2, ZrO2, ZrO2-Y2O3 Thin Films on Si(001) Wafers with High Dielectric Constant**

Hirofumi Shimizu and Toshikazu Nishide *College of Engineering, Nihon University Tamura-machi, Koriyama, Fukushima, Japan* 
