**5. Conclusions and remarks**

112 Advances in Unconventional Lithography

Fig. 40. (A) Catalytic activity of hncp Al2O3. (B) Catalytic activity evaluation of different substrates based on the absorbance ratio A/A0 as a function of reaction time. A and A0 are

catalytic performance of the hncp alumina for such isomerization. Figure. 40B presents the isomerization process of ethyl acetoacetate in the presence of a silicon wafer and alumina film (by sputtering without using a colloidal monolayer) under the same deposition condition. These results indicate that the hncp alumina exhibited efficient catalytic activity

the absorbance after a given reaction time and that from the initial solution.

The physical deposition assisted colloidal lithography has proven to be a facile, inexpensive, versatile route to construct hierarchical micro/nanostructured arrays with controlled morphologies, sizes, periodicities. The morphologies of these hierarchical micro/nanostructured arrays can be tuned by controlling the experimental conditions, including deposition time, background gas pressure in the vacuum chamber, periodicity of colloidal monolayer template etc. Compared with chemical routes, the physical deposition are more suitable for preparing high quality micro/nanostructured arrays with uniform morphologies. These special structures possess morphology- or size-dependent properties, such as superamphiphilicity, superhydrophobicity, photocatalytic activity, field emission etc., which have important applications in devices, microfluidic devices, field emitters, solar cells etc. Compared to development of fabrication strategies of micro/nanostructured arrays, investigation of morphology- or parameter- properties and micro/nanodevices dependent on them is not so much. The more micro/nanodevices based on these structures will be hoped, and it might be realized under researchers` efforts in the future.
