**2.3.2 Development parameter measurement results**

Fig.15 compares measurements of the discrimination curve (a logarithmic plot of development rates and exposure values) development parameter. We found no significant differences between development parameter values obtained with KrF and EUV exposures.

Approach to EUV Lithography Simulation 183

We performed EUVL simulations using the simulation parameters obtained. Table 7 gives

Table 6 is a list of simulation parameter measurement results.

Table 6. Simulation parameter measurement results

**2.3.4 Examination of simulation** 

the simulation conditions used.

Table 7. Simulation conditions

Fig. 15. Comparison of development parameter values

## **2.3.3 De-protection reaction observations and results of de-protection reaction parameter measurements**

Fig.16 shows IR spectra obtained from the MET-1K before and after 16-mJ/cm2 exposures. The figure indicates weakened (-CO) bonds due to de-protection reactions at 1,230 cm-1. The extent of the peak decline with KrF exposure is roughly identical to that with EUV, indicating the absence of significant differences in de-protection reactions.

Fig. 16. Observations of de-protection reactions with KrF and EUV exposures

Fig. 15. Comparison of development parameter values

**parameter measurements** 

**2.3.3 De-protection reaction observations and results of de-protection reaction** 

indicating the absence of significant differences in de-protection reactions.

Fig. 16. Observations of de-protection reactions with KrF and EUV exposures

Fig.16 shows IR spectra obtained from the MET-1K before and after 16-mJ/cm2 exposures. The figure indicates weakened (-CO) bonds due to de-protection reactions at 1,230 cm-1. The extent of the peak decline with KrF exposure is roughly identical to that with EUV,


Table 6 is a list of simulation parameter measurement results.

Table 6. Simulation parameter measurement results
