**1.2 System configuration**

The virtual lithography evaluation system (VLES) proposed consists of an EUV open-frame exposure system, a resist development analyzer, and a lithography simulator. Fig. 1 is a schematic diagram of the VLES.

Fig. 1. Schematic diagram of the VLES

0.93 0.31 1 0.4

1.2 0.28

Tech. Node 65 nm 45 nm 32 nm 22 nm 16 nm NA k1 k1 k1 K1 k1

1.35 0.31 0.22 0.15 1.35DP 0.20 0.18

0.25 0.59 0.41

Table 1. Relationship among technology node, numerical aperture (NA), and process factor

The virtual lithography evaluation system (VLES) proposed consists of an EUV open-frame exposure system, a resist development analyzer, and a lithography simulator. Fig. 1 is a

0.35 0.57 0.41 0.45 0.53

Wavelength (nm)

193

13.5

**1.2 System configuration** 

schematic diagram of the VLES.

Fig. 1. Schematic diagram of the VLES

(k1)

Fig. 2. Analyzers used in the VLES

Fig. 2 shows the analyzers comprising the VLES.
