**7. The control of parallelism and uniformity in ribbon beams**

The approach pioneered in the ASM220 implanter [9] (**Figure 2**) for collimating scanned beams was easily adapted for DC ribbon beams. Varian had acquired the ASM implant division and now licensed the technology of the SHC-80 implanter of DSG, so the first prototype of the SHC-80 used the ASM-220 (now E220) wafer handler. The
