Preface

*Ion Beam Technology and Applications* discusses important topics in the use of ion beams, which have a wide range of applications in medicine, science, and engineering.

To understand the basic physical processes of ion beams, this book begins by considering the theoretical framework for the interaction of ion beams with matter in "Introductory Chapter: Ion Beam Technology and Applications" before moving on to a discussion of the research on ion beam applications.

Chapter 2, "Ion Beam Application to Nuclear Material Damage Assessment", discusses applications of ion beam technology in the evaluation of nuclear material damage.

Chapter 3, "Surface Microstructure Changes Induced by Ion Beam Irradiation", uses mathematical models in the literature to explain the experimental evidence because the phenomenon is quite complex to understand. For this aim, the material surface sputtering induced by the irradiation is investigated and is given experimental evidence of microstructure changes induced by ion beam irradiation based on certain irradiation conditions.

Chapter 4, "Oblique Ar<sup>+</sup> Sputtered SiC Thin Films: Structural, Optical, and Electrical Properties", presents the investigation of structural, optical, and electrical behavior of as-deposited and argon (Ar) sputtered silicon carbide (SiC), which has a wide range of applications in industries and research fields, in ion incidence angle of 500 via experimental facility 200 kV Ion accelerator at Ion Beam Centre, KUK.

Chapter 5, "Electron Beam Processing of Biological Objects and Materials", investigates electron accelerators, including the physical properties of the electron beam, dose ranges, computer simulation of the electron irradiation method, and the depth dose non-uniformity in objects irradiated with accelerated electrons. Additionally, this chapter compares methods used for the irradiation of polymers, transplantology objects, medical items, pharmaceuticals, and foods.

Finally, Chapter 6 "DC Parallel Ribbon Ion Beams for High-Dose Processes", highlights an important step forward in the development of ion beam technology. The chapter mentions the advantages of ribbon beams of heavy ions over cylindrical ions and the development of a new magnetic configuration in ion beam technology.

I would like to thank the authors for their valuable contributions to the book. I am also grateful to IntechOpen Service Manager Ms. Elena Vracaric for her help and support throughout the publishing process.
