**4. Surface sputtering applications**

The material sputtering as a result of being irradiated with some irradiation type has a large number of practical applications, for example, in thin film deposition and as a material characterization tool. A series of images of the fabrication process of a sample in cross-section for transmission electron microscopy are shown in **Figure 13**. The sample was obtained using a (Focused Ion Beam system) dual beam scanning microscope, this type of microscope has two optical systems, one of electrons and the second of ions, with both systems, it is possible to obtain images with different perspectives. The cutting process is performed by sputtering the selected region using a gallium ion beam.

**Figures 13** and **14** show images of the sample selection and cutting processes, both of which are very high-precision processes. The sample sizing process is performed using sputtering of the excess material, depending on the dimensions of the selected
