**Author details**

Nicholas R. White Albion Systems, Manchester, Massachusetts, USA

\*Address all correspondence to: nick.white@ieee.org

© 2023 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/3.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

*DC Parallel Ribbon Ion Beams for High-Dose Processes DOI: http://dx.doi.org/10.5772/intechopen.111487*
