**2.2 Low-cost deposition/incorporation methods**

Deposition techniques and incorporation methods have been developed drastically and several deposition improved methods have been investigated for fabrication of solar cells at high deposition rates (0.9 to 2.0 nm/s), such as hot wire CVD, high frequency and microwave PECVD, , and expanding thermal plasma CVD. Parallel to these improvements, vacuum conditions and chemical processes cost increased the manner that serial fabrication becomes sometimes limited. Nowadays, it is expected that low processing temperature allow using a wide range of low-cost substrates such as glass sheet, polymer foil or metal. These features has made the second-generation low- cost metal-oxides thin-film solar cells promising candidates for solar applications.
