*7.1.2 Nanolithography*

It is a nanofabrication technique for developing nanopatterns with a size range between 1 and 100 nm. It can be divided into two types:

i. Mask lithography includes soft lithography, nanoimprint lithography, and photolithography—In these masks, molds or templates are used in

**Figure 5.** *Schematic diagram of top-down and bottom up method.*

nanopattern fabrication, while in maskless lithography nanopatterning is performed without the involvement of masks.

ii. Mask-less lithography including electron beam lithography, focused ion beam lithography, and scanning probe lithography.
