*Sputtering Deposition DOI: http://dx.doi.org/10.5772/intechopen.107353*

In the presence of an electric field, gas ions speed up the bombardment of the target to produce sputtering atoms which eventually condense on the substrate to produce the required film. We conclude that the ionization rate and ion bombardment rate at the target surface raise under the effect of an electric field, and hence sputter rates increase [13].
