**6. Conclusions**

The chemical vapor deposition method provides graphene films of good quality and large area, the many variants of the method allow versatility in a number of parameters such as: precursor used, temperature, and pressure. From its first reports more than 10 years ago, CVD has remained as reliable technique to produce graphene films, many advances have been reported since, and understanding of the role of every parameter in the synthesis has been achieved. CVD graphene is polycrystalline by nature, and when more than one layer is produced, the mismatch or stacking of layers is not controlled, and these characteristics might condition its performance at the mechanical and electrical level. Applications that require continuous, conductive, transparent films can be tackled using CVD graphene; however, the transfer process remains a challenge to overcome.

*Chemical Vapor Deposition Synthesis of Graphene on Copper Foils DOI: http://dx.doi.org/10.5772/intechopen.106058*
