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Plasma Science and Technology http://dx.doi.org/10.5772/intechopen.95256 Edited by Aamir Shahzad

### Contributors

Eduard V. Rostomyan, Muhammad Asif Shakoori, Maogang He, Aamir Shahzad, Misbah Khan, Santanu Karmakar, Jagadish C. Mudiganti, Hui Hu, Cem Kolbakir, Haiyang Hu, Yang Liu, Vladimir I. Sotnikov, Irina Litovko, Alexey Goncharov, Andrew Dobrovolskii, Iryna Naiko, Heremba Bailung, Rakesh Ruchel Khanikar, Sukhmander Singh, Bhavna Vidhani, Ashish Tyagi, Weihao Liu, Zijia Yu, Zhi Tao, Sachin Kaothekar, Palash Jyoti Jyoti Boruah, Parismita Kalita, Aadil Mahboob, Muhammad Kashif, Alina Manzoor, H.E. Maogang, Madiha Naheed

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First published in London, United Kingdom, 2022 by IntechOpen IntechOpen is the global imprint of INTECHOPEN LIMITED, registered in England and Wales, registration number: 11086078, 5 Princes Gate Court, London, SW7 2QJ, United Kingdom Printed in Croatia

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Plasma Science and Technology Edited by Aamir Shahzad p. cm. Print ISBN 978-1-83969-623-7 Online ISBN 978-1-83969-624-4 eBook (PDF) ISBN 978-1-83969-625-1
