**4.3 Radio frequency magnetron sputtering method**

The technique of RF magnetron sputtering (**Figure 8**) has been widely adopted for the high-rate deposition of thin films. This deposition technology involving a gaseous plasma which is generated and confined to a space containing the surface of the target which is eroded by high-energy ions within the plasma, and the liberated atoms travel through the vacuum environment and deposit onto a substrate to form a thin film. J. Singh et al. [10] have prepared TiO2 thin films deposited on silica glass substrates by RF magnetron sputtering combined with thermal annealing

**Figure 8.** *Radio frequency magnetron sputtering method.*

at 2.5×10−3 Torr and substrate temperature of 200°C. TiO2 film exhibits highly enhanced photocatalytic activity leading to complete photocatalytic degradation of 2.1 μM MB in water in only 45 minutes of sun light irradiation, which is very promising for practical photocatalytic applications.
