**Author details**

Ramasamy Velmurugan\* and Balasubramanian Subramanian Electroplating and Metal Finishing Division, Central Electrochemical Research Institute (CSIR), Tamilnadu, India

\*Address all correspondence to: selvavelanr@gmail.com

© 2021 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/ by/3.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

*Physicochemical Approaches for Thin Film Energy Storage Devices through PVD Techniques DOI: http://dx.doi.org/10.5772/intechopen.99473*
