**Abstract**

Recently, graphene nanomaterial has drawn great interest due to its excellent electrical and optoelectrical properties. The etching of graphene based on plasma engineering to achieve atomically thin layer and extremely clean surface is a hot issue, which is highly desirable for industrial applications. The resided contaminants with high intrinsic roughness create the degradation of performance. The impurities are removed via surface cleaning method and layer-by-layer plasma etching via top-down lithography. Recently, new plasma technology-based etching causes no damage and secures its π-binding, which plays a key role in conductivity and other characteristics. Thus, this chapter presents the recent advances in new etching technologies for nanomaterials (e.g., graphene) as well as emerging applications based on these technologies.

**Keywords:** graphene etching, plasma, ion beam, neutral beam, inductively coupled plasma (ICP), atomic layer etching (ALE), reactive ion etching (RIE), chemical vapor deposition (CVD)
