**4. Conclusions**

Generally, there are many unexploited huge potentials from the etchedgraphene products, but the perspectives are bright. If these etching technologies are extended to other nanomaterials such as transition metal dichalcogenides (TMDs) or transition metal carbides, nitrides, and carbonitrides (MXenes), and black phosphorous [42], it will definitely achieve high-quality electronics and optoelectronics. Bandgap tuning for nanomaterials will significantly improve the on/off current ratio, photoresponsivity, quantum efficiency, conductivity and others. Layer-by-layer etching for multilayer materials by low-energy plasma technology (double mesh grids inserted for plasma apparatus such as chlorineradical ICP, neutral-beam ICP and ion beam ICP) with no physical damage would be the next research direction and can be applied to the other low-dimensional materials [28, 43] to achieve ultrahigh performance of electronic and optoelectronic devices [28, 43]. For instance, in the latest report in 2019, Kim et al. utilized a chlorine ICP innovative plasma apparatus that has no physical damage effect by inserting double mesh grids for cyclic ALE process on intrinsic multilayer MoS2 and successfully fabricated heterostructured photodetector with ultraresponsivity (~10<sup>6</sup> A/W) in the visible range [43].

**69**

**Author details**

South Korea

Phuong V. Pham1,2,3

University (SKKU), Suwon, South Korea

provided the original work is properly cited.

1 SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan

3 School of Information Science and Electronic Engineering, College of

Microelectronics, Zhejiang University, Hangzhou, China

\*Address all correspondence to: pvphuong@skku.edu

2 Center for Multidimensional Carbon Materials, Institute for Basic Science, Ulsan,

© 2020 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/ by/3.0), which permits unrestricted use, distribution, and reproduction in any medium,

*The New Etching Technologies of Graphene Surfaces DOI: http://dx.doi.org/10.5772/intechopen.92627*
