*2.1.6.1 Procedure for pulsed laser deposition method*

Pulsed Laser deposition is a thin film deposition technique in which the target material is vaporized by pulsed laser beam and vaporized target atoms are made to deposit on substrates **Figure 4**. The furnace contains a target at bottom and substrate mounted on the top. A pulsed laser beam from Nd:YAG laser source is made to strike the target to produce vaporized target atoms called the plume (plume is vaporized atoms at high temperature) [27]. The plume moves towards the substrate and it is deposited and grown as CNTs. Each shot of laser is directly related to the amount of material ablated, thus deposition rate can be controlled and calibrated.
