Chapters by Prof. Hitoshi Habuka

• Book Chapter Silicon Epitaxial Reactor for Minimal Fab
  by Ning Li, Hitoshi Habuka, Yuuki Ishida, Shin-ichi Ikeda and Shiro Hara in the book "Epitaxy" edited by Miao Zhong, ISBN 978-953-51-3890-7, Print ISBN 978-953-51-3889-1, InTech, March 3, 2018
• Book Chapter In Situ Observation of Chemical Vapour Deposition Using Langasite Crystal Microbalance
  by Hitoshi Habuka in the book "Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices" edited by Sudheer Neralla, ISBN 978-953-51-2573-0, Print ISBN 978-953-51-2572-3, InTech, August 8, 2016
• Book Chapter Etching of Silicon Carbide Using Chlorine Trifluoride Gas
  by Hitoshi Habuka in the book "Physics and Technology of Silicon Carbide Devices" edited by Yasuto Hijikata, ISBN 978-953-51-0917-4, InTech, October 10, 2012
• Book Chapter Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas
  by Hitoshi Habuka in the book "Properties and Applications of Silicon Carbide" edited by Rosario Gerhardt, ISBN 978-953-307-201-2, InTech, April 4, 2011